ALMU
AelumaCNasdaq / Semiconductors & Semiconductor Equipment
Last Price
At close
2026-06-02
Current thesis
The post-earnings bull case rests on management showing real operating milestones rather than only concept value: six engagements totaling $5 million, more than $4 million of government-related contracts, NASA-backed work, and new manufacturing relationships that could improve scale economics [#8-K-2026-05-13]. Strong cash also lowers near-term dilution pressure [#10-Q-2026-05-13].
Posture
Mixed
Lead driver
Momentum
What changed
1 setup hits (3d) with net bullish as of 2026-06-02.
What can break
Analyst coverage appears thin, so post-earnings estimate and target revision visibility is limited and can amplify volatility.
Momentum
72
Value
35
Sentiment
44
Setup hits (3d)
1 · Net Bullish
AI TargetsBase $23.00 · Bull $32.00 · Bear $15.00
Data freshness
Prices
As of 2026-06-02
Fundamentals
As of 2026-06-01 • Vendor: Data Vendor v1
Scores
As of 2026-06-02 • Model: HYBRID_IC_RP
AI Memo
As of 2026-05-16 • Model: RankAlpha Sentiment Codex
Investment thesisAs of 2026-06-02
Investment thesis
As of 2026-06-02
Supporting evidence
What
Grade C · Mixed
Confidence Medium · Net Bullish
Target $22.50
Why
Momentum72 · Δ7d +3.1
Value35 · Δ7d +0.0
Sentiment44 · Δ7d -11.0
So what
Balanced signals (Net Bullish). Wait for confirmation before sizing up.
Lead driver: Momentum · See technicals
Momentum
72
34% active weight
Current posture
7d trendSoftening
Δ7d
+3.1
Δ21d
-2.6
Value
35
32% active weight
Current posture
7d trendFlat
Δ7d
+0.0
Δ21d
-0.1
Sentiment
44
33% active weight
Current posture
7d trendSoftening
Δ7d
-11.0
Δ21d
-
Why this grade
Composite grade C. Momentum 71.8 / Value 34.9 / Sentiment 44.5
Fundamentals (TTM)As of 2026-06-01
Fundamentals (TTM)
As of 2026-06-01
Market Cap
$479.78M
Beta
-
Shares Out
17.86M
P/E (TTM) · Derived
-117.1
P/S (TTM)
61.69
P/FCF (TTM) · Derived
-275.27
Rev YoY
+188.1%
EPS YoY
-54.4%
Gross Margin
+59.2%
Op Margin
-54.2%
Net Debt
-$15.74M
Current Ratio
52.38
As of 2026-06-02 • Updated nightlySource: Internal modelMethodology